dc.creator | Ihde, S.-K.-A. | |
dc.creator | Konstantinović, Vitomir | |
dc.date.accessioned | 2020-07-02T12:08:56Z | |
dc.date.available | 2020-07-02T12:08:56Z | |
dc.date.issued | 2005 | |
dc.identifier.issn | 1158-1336 | |
dc.identifier.uri | https://smile.stomf.bg.ac.rs/handle/123456789/1258 | |
dc.description.abstract | The therapeutic possibilities are limited in the event of pathological phenomena occurring for crestal implants. For basal implants, on the other hand, there are many possibilities if complications occur. Treatments pulled by functional adaptations or a treatment mixing a surgery-function of the jaw-implant-prosthesis system are definitely more often observed that treatments for an infection. Within this framework, needs and therapeutic possibilities differ strongly between basal and crestal implants. The replacement or the addition of basal implants is generally easy, more especially as a fast intervention makes it possible to take again the treatment with a sufficient quantity of cortical bone. A specific clinical training is necessary to be able to assess the correct diagnosis and to set up an adequate treatment for basal implants. Moreover, it is necessary to have specific tools for this system of implants, and of course additional basal implants are often needed to cure pathological complications. The manufacturer thus allows only professionals who comply with official authorisation to work on these basal implants. | en |
dc.publisher | Elsevier Masson SAS | |
dc.rights | restrictedAccess | |
dc.source | Implantodontie | |
dc.subject | Basal implantology | en |
dc.subject | Complications | en |
dc.subject | Implants | en |
dc.subject | Perished-implantite | en |
dc.title | Comparison and definition of the pathological phenomena occuring after a tooth replacement and the possible therapeutic stages implying basal and crestal implants | en |
dc.type | article | |
dc.rights.license | ARR | |
dcterms.abstract | Константиновић, Витомир; Ихде, С.-К.-A.; | |
dc.citation.volume | 14 | |
dc.citation.issue | 4 | |
dc.citation.spage | 176 | |
dc.citation.epage | 185 | |
dc.citation.other | 14(4): 176-185 | |
dc.identifier.doi | 10.1016/j.implan.2005.10.006 | |
dc.identifier.scopus | 2-s2.0-33746513678 | |
dc.type.version | publishedVersion | |